Gourav B.

WORK HISTORY

EDUCATION

ABOUT GOURAV B.

Dr. Gourav Bhowmik is a multidisciplinary scholar whose research and professional work span semiconductor process engineering, thin film deposition, ion-solid interactions, and nonlinear optics in solid-state materials. He currently holds a technical lead role at Applied Materials, Inc, where he supports Intel’s advanced node development in front-end-of-line (FEOL) and middle-of-line (MOL) process integration. His role bridges applied research with industrial manufacturing, focusing on metallization modules, contact formation, and silicide development for cutting-edge semiconductor devices.Dr. Bhowmik completed his Ph.D. in Nanoscale Engineering at the Colleges of Nanoscale Science and Engineering, SUNY Albany, where he explored second harmonic generation from silicon surfaces engineered with embedded silver nanostructures—work that contributes to the field of silicon-based nonlinear nanophotonics. His doctoral research further included ion implantation, e-beam deposition, and thermal processing techniques to create non-equilibrium materials systems such as Ge₁₋ₓSnₓ alloys and Er-doped thin films for photonic and optoelectronic applications.His academic output includes 10+ peer-reviewed publications, spanning topics such as laser damage resistance in multilayer coatings, PL modulation in MoS₂, and electrochemical surface engineering. Dr. Bhowmik has participated in collaborative programs with Lawrence Livermore National Laboratory, Tokyo Electron, and NVision Imaging, and was instrumental in developing high-power laser components through material characterization using RBS, PIXE, XRD, and spectroscopic ellipsometry.Beyond research, he has contributed to the academic community as an expert journal reviewer, conference committee member, and mentor to engineers, undergraduate and graduate researchers. His accolades include the SUNY Chancellor’s Award for Student Excellence, UA President’s Awards, and distinction as a commencement speaker. Dr. Bhowmik’s academic and professional journey exemplifies a deep integration of research excellence, industry collaboration, and scientific service.