Jesse Frantz
Research Physicist @U.S. Naval Research Laboratory
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WORK HISTORY
Research Physicist @U.S. Naval Research Laboratory
Washington, DC, US
Dr. Frantz is currently the Head of the Specialty Waveguides Section within the Optical Materials and Devices Branch—a group that has a long history of developing new optical materials in bulk and fiber optic form. He has leveraged the expertise and infrastructure of this Branch to develop world class thin film capabilities that are unique within the DoD. He has built up deposition and deposition and characterization capabilities for thin films of novel materials required for Navy applications that require films with unique properties such as midwave infrared (MWIR) or longwave infrared (LWIR) transparency, phase change behavior, high optical nonlinearity, etc, not found in standard materials. He led a team that developed chalcogenide glass (ChG) waveguides for use in MWIR nonmechanical beam steering (NMBS) chips that provide a high speed and low size, weight, and power (SWaP) alternative to the slow, bulky mechanical steerers that are currently in use. He also acts as the NRL PI on a continuing program on ChG-based metasurfaces that take advantage of the extraordinarily high nonlinearity of ChG materials. He recently demonstrated new techniques for passivating atmosphere-sensitive ChGs and developed a new method of post-deposition tuning of the optical response of a ChG metasurfaces.
EDUCATION
University of Arizona
Ph.D., Optical Sciences
Vassar College
AB, Physics
Vassar College
B.A, Physics
University of Arizona
M.S, Optical Sciences
University of Arizona
Ph.D, Optical Sciences 2004
SKILLS
ABOUT JESSE FRANTZ
Optical physicist with over 10 years of experience in thin films, waveguides, and optoelectronics with a track record of solving large and challenging problems. Skilled in photolithography and thin film modelling, deposition, and metrology.Skills:• Thin film deposition techniques including sputtering, thermal evaporation, E-beam evaporation, atomic layer deposition, and photolithography.• Thin film metrology techniques including scanning electron microscopy (SEM), atomic force microscopy (AFM), spectrophotometry, ellipsometry, profilometry, energy dispersive spectroscopy (EDS), X-ray diffractometry (XRD), Raman spectroscopy, and X-ray photoelectron spectroscopy (XPS).• Design of thin film structures including multilayer reflective coatings and AR surface structures for ultraviolet through long-wave infrared applications.• Design, fabrication, and characterization of integrated-optic waveguides.• Fiber optic systems and lasers for visible and infrared applications.• Software: MATLAB, Zemax, Mathematica, FilmStar.
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