Vinya V.
Process & Software Development Engineer @Tekscend Photomask (formerly Toppan Photomask)
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WORK HISTORY
Process & Software Development Engineer @Tekscend Photomask (formerly Toppan Photomask)
Dresden, DE
EDUCATION
Central Hindu Girls School Varanasi
12th
Technische Universität Dresden
Master of Science - MS
Central Hindu Girls' School, Varanasi
10th
National Institute of Technology Agartala
Bachelor of Technology (BTech)
ABOUT VINYA V.
I am a graduate research assistant at Fraunhofer IPMS - CNT, one of the leading research institutes in the field of microelectronics and nanotechnology. I have a master\'s degree in nanoelectronic system from Technische Universität Dresden, and over a year of experience in semiconductor device fabrication, process development, and materials characterization. My current research project involves developing integrated silicon nitride waveguides for applications in the visible and infrared wavelength range in a 300 mm CMOS clean room. I have successfully developed and optimized the PECVD process for silicon oxide and silicon nitride films, and characterized them using ellipsometry and XPS. I have also demonstrated a high level of versatility and adaptability by working on different projects related to amorphous silicon and nanoelectronics during my master thesis and student research assistantship. My goal is to contribute to the advancement of nanoelectronic system and semiconductor technology through innovative and collaborative research.
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