Susmi Das

EUV and Hi Na lithography resist evaluation | Dry Krf/Arf PFAS free resist evaluation | Immersion lithography track engineer | Team lead | Customer engagement | Ex-Intel .

Role
Principal Process Engineer at Microchip Technology Inc.
Location
Hillsboro, OR, US
LinkedIn followers
500 followers

About Susmi Das

Experienced Lithography Process Engineer with 11 years in semiconductor manufacturing, specializing in sustaining and development of 14nm and 10nm front-end FIN layers, immersion track tool ownership and resist evaluation for dry Krf/ dry Arf/ immersion/ EUV/ Hi-NA lithography tools.Demonstrated ownership of immersion track systems and strong attention to detail and consistent delivery of high-quality results. Successfully trained and onboarded new engineers, ensuring rapid integration and operational readiness.Conducted evaluation of novel metal oxide resist on EUV lithography systems with pilot run to monitor daily CD/ defect trend for baseline trending and presented data to upper forum. Led project on litho side and worked in collaboration with thin films/ etch module for dose reduction with minimal impact/ improvement on process window performance and defectivity.Led evaluations of Per- and polyfluoroalkyl substances free (PFAS-free) chemically amplified photoresists for dry KrF/ArF lithography in response to evolving government environmental regulations. Focused on via and grating layer applications, working with multiple vendors to assess performance and patterning quality. Delivered continuous feedback to vendors, driving material improvement. Acted as team lead, providing technical guidance, troubleshooting support, and ensuring tool and process functionality across all stages of resist evaluation.Evaluated ample of small and gallon samples of chemically amplified photoresists on immersion, EUV and Hi-NA lithography tools for contact/hole layers using CD-SEM and Fractilia for pattern fidelity and defect analysis. Worked on contact/ holes evaluation using both binary and embedded phase shift masks (ePSM), selecting mask type based on critical dimension (CD) pitch requirements.

Experience

  1. Principal Process Engineer

    Microchip Technology Inc.

    Apr 2026 — Present · Gresham, OR, US

Education

  • University of Mumbai

    Bachelors, Engineering

    2001 — 2005

  • University of Houston

    Masters, Electrical Engineering

    2007 — 2009

  • University of Houston

    Doctor of Philosophy (PhD), Electrical Engineering

    2009 — 2014

Skills

  • Instrumentation
  • Versapro
  • Cadence Virtuoso
  • Matlab
  • Calp
  • Optical Lithography
  • Xilinx
  • Sem
  • Autocad
  • Silvaco
  • Electrical
  • Wet Etching
  • Etching
  • Integrated Circuit Design
  • L-Edit
  • Fpga
  • Vhdl
  • Psoc
  • Plasma Etch
  • Lvvl
  • Confocal Microscopy
  • Labview
  • Comsol
  • Verilog
  • Pspice
  • Afm
  • Xps
  • Lvdac-Ems
  • Mathcad
  • Altera Quartus
  • Solidworks
  • Photolithography

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Susmi Das — Principal Process Engineer at Microchip Technology Inc. in Hillsboro, OR, US | Unifers