Rizwanur Rahman
Module Development Engineer | Ph.D. Chemical Engineering | Dry Resist & Etch Integration | 2024 Exceeds Expectations | EUV Dose Reduction | 14A/18A Node Contributor | Writer & Liverpool FC Fan
- Role
- Module Development Engineer - Lithography at Intel
- Location
- Beaverton, OR, US
- LinkedIn followers
- 500 followers
About Rizwanur Rahman
I am a Ph.D. Chemical Engineer and Process Developer with 4+ years of direct…
Experience
Module Development Engineer - Lithography
Mar 2022 — Present · Hillsboro, OR, US
Specialized expertise in etch processes of \'Dry\' photoresist materials and underlying stacks, which differ fundamentally from traditional CARs; bridging lithography and etch integration to provide unique value beyond typical litho engineering roles Driving EUV dry photoresist dose reduction initiatives targeting 8–10% savings to improve process efficiency; previously contributed to a similar project, achieving 20% dose reduction, earning the TD Divisional Award Key contributor to Intel’s 14A node, leading technical collaborations with multiple vendors to develop dry resist solutions and master diverse etch methods; optimized process flow and resist chemistry to enable tighter pitch patterning and achieved a 15% process window improvement Contributed to 18A DUV lithography projects, acting as layer owner and qualifying a new Track tool during technology transfer to ensure smooth integration and seamless transition to high-volume manufacturing (HVM) Awarded “Exceeds Expectations” performance rating for exceptional contributions in 2024 Mentored and trained 3 new engineers, accelerating team capability and onboarding
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