Rajkumar Govindarajan
Process Engineer at Intel Corporation
- Role
- Process Engineer at Intel
- Location
- Hillsboro, OR, US
- LinkedIn followers
- 500 followers
About Rajkumar Govindarajan
Graduate Research Experience: o Developed a wet process based on catalyzed hydrogen peroxide (CHP) chemical system for stripping of implanted state-of-the-art deep UV resists.o Investigated the potential of catalyzed hydrogen peroxide to disrupt refractory crust layers formed on high dose implanted resists.o Established the relationship between radical production and oxidant stability in CHP system and its utilization in photoresist removal to replace plasma ash and high temperature SPM stripping processes.o Parameters investigated: temperature, time and peroxide/catalyst level.o Successfully characterized the effect of potassium iodate on the electrochemical mechanical planarization (ECMP) of Ta/TaN films based on Dihydroxy benzene sulfonic acid (DBSA) system.o Investigated the Galvanic corrosion characteristics of polysilicon–tantalum nitride couple immersed in dilute HF solutions
Experience
Process Engineer
Mar 2012 — Present
Education
University of Arizona
Doctor of Philosophy (PhD), Materials Science and Engineering
2008 — 2011
Central Electrochemical Research Institute (CECRI)
Bachelor of Technology (B.Tech.), Chemical and Electrochemical Engineering
2002 — 2006
Skills
- Materials
- Scanning Electron Microscopy
- R&D
- Materials Science
- Matlab
- Tem
- Afm
- Nanotechnology
- Characterization
- Spc
- Powder X-Ray Diffraction
- Cvd
- Thin Films
- Sputtering
- Statistical Process Control (Spc)
- Design of Experiments
- Semiconductors
- Electrochemistry
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