Prashant Raghu

Director of Process Engineering at Micron Technology Inc.

Role
Director, Thin Film Dram Process Development at Micron Technology
Location
Boise, ID, US
LinkedIn followers
500 followers

About Prashant Raghu

Leading Process technology development with broad experience in areas of thin film deposition, surface preparation, wafer cleaning, plasma strip, bevel etch, copper plating and CMP.

Experience

  1. Director, Thin Film Dram Process Development

    Micron Technology

    Jun 2021 — Present · Boise, ID, US

    Developed CVD, ALD, Epitaxy and Laser Anneal innovative process technologies in thin films deposition for DRAM, Emerging Memory and 3D memory devices in R&D.Process champion for advanced node DRAM technology; leading from process spec and roadmap definition to cost and manufacturing readiness.Hired, trained and developed new leaders to support organization expansion for 3D memory devices.Led Data Science and Process Modeling applications to improve process performance in advanced nodes.Championed energy sustainability for DRAM and NAND.

Education

  • University of Arizona

    Ph.D., Chemical Engineering

    1998 — 2003

  • UDCT/UICT, Mumbai

    B.S., Chemical Engineering

    1994 — 1998

Skills

  • Semiconductor Fabrication
  • Nanotechnology
  • Etching
  • Thin Films
  • Ic
  • Design of Experiments
  • Manufacturing
  • Semiconductors
  • Jmp
  • Materials Science
  • Failure Analysis
  • Semiconductor Industry
  • Matlab
  • Semiconductor Process
  • Electronics
  • R&D
  • Semiconductor Process Technology
  • Silicon
  • Characterization
  • Simulations
  • Electroplating
  • Dram
  • Process Simulation
  • Process Integration
  • Vendor Management
  • Cvd
  • Cmos

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Prashant Raghu — Director, Thin Film Dram Process Development at Micron Technology in Boise, ID, US | Unifers