Oleg Khodykin
Head of Advanced Source Development @科磊股份有限公司
San Francisco, CA, US
EMAILS
o••••••••@ontoinnovation.com
MOBILE NUMBERS
+18•••••••15
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WORK HISTORY
Apr 2011 — Present
Head of Advanced Source Development @科磊股份有限公司
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Development of next generation reticle inspection and wafer metrology products. Program and project management of EUV mask inspection tool.Manager of EUV source group.
EDUCATION
1994 — 1998
Moscow Institute of Physics and Technology (State University) (MIPT)
Ph.D, Solid State Physics
1986 — 1994
Moscow Institute of Physics and Technology (State University) (MIPT)
M.Sc, Applied Physics and Mathematics
SKILLS
LithographyPowder X-Ray DiffractionPatentsSputteringVacuumMatlabPvdNanofabricationOptoelectronicsR&DAlgorithmsCharacterizationScanning Electron MicroscopySpectroscopyPlasma PhysicsSiliconPhysicsElectronicsSensorsDesign of ExperimentsMaterialsZemaxUhvExperimental PhysicsLaser PhysicsMemsPolymersSignal ProcessingMathematicaMicroscopyNonlinear OpticsThin FilmsPhotolithographyAfmOptical EngineeringMaterials ScienceFailure AnalysisSemiconductor IndustryMetrologySimulations
ABOUT OLEG KHODYKIN
Program and project management.Technical lead of cross-functional teams in the development of N+1, N+2 products.Semiconductor inspection and metrology equipment: reticle inspection, wafer metrology (CD and OVL).IP generation.
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