Nupur B.
Semiconductor Professional | Thin film Technologist
- Role
- Process Engineer at Applied Materials
- Location
- Santa Clara, CA, US
- LinkedIn followers
- 500 followers
About Nupur B.
Group IV based epitaxial process development on ASM\'s Epsilon and Intrepid • Low temp and high temp chemical vapor deposition (CVD) epi processes: SEG processes• Pre-epi clean development on ASM\'s Previum• Growth processes using Molecular Beam Epitaxy (MBE) for Group IV elements• Tool owner EPI-620 MBE in Class clean room and Panalytical X’Pert MRD High resolution X-ray Diffraction (HRXRD) • Designed and Fabricated SiGe, GeSn, doped GeSn,SiC alloys using MBE • Characterization experience HRXRD, XRR, GIXRD, AFM, 4pp, Hall effect, I-V, profilometry, Ellipsometry, SRP, FTIR, SEM• Band gap simulations using FemB software• Device fabrication : Photolithography, ion beam etching, sputtering and evaporation• Mask design: using AutoCAD
Experience
Process Engineer
Jan 2024 — Present
Education
University of Delaware
Doctor of Philosophy (PhD), Electrical Engineering
2013
Skills
- Sputtering
- Photolithography
- Afm
- Etching
- Magnetics
- Evaporation
- Molecular Beam Epitaxy
- X-Ray Diffraction Analysis
- X-Ray Reflectivity
- Wet Chemical Etching
- Autocad
- Thermal Evaporation
- E-Beam Evaporation
- Annealing
- Profilometer
- Hall Effect
- Thin Film
- Epitaxy
- Device Characterization
- Thin Film Characterization
- Ms Office
- Origin
- Simnra
- Characterization
- Semiconductors
- Semiconductor Device
- Clean Rooms
- Simulations
- Thin Films
- Powder X-Ray Diffraction
- Scanning Electron Microscopy
- Nanofabrication
- Microfabrication
- Nanotechnology
- Semiconductor Fabrication
- Sputter Deposition
- Optoelectronics
- Microsoft Office
- Chemical Vapor Deposition (Cvd)
- Mbe
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