Justin Nhan
Src Research Scholar @Src Research Scholars Program
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WORK HISTORY
Src Research Scholar @Src Research Scholars Program
SRC Research Program: GRC NMPTask ID: 32•••01Task Title: Mechanistic Study of Secondary Electron Emission and Molecular Diffusion from UnderlayersProject Description: Three inter-related tasks are studied to develop a holistic understanding of the role underlayers play in EUV lithography. The first task focuses on the interdiffusion between the underlayers and photoresists; the second task investigates the secondary electron emissions from underlayers; and the third task applies these findings to interpret the underlayer effects on a EUV photoresist’s contrast curve. This comprehensive study will enable the design of better performing photoresist-and-underlayer pairings, and facilitate faster optimization processes for these pairings to meet the upcoming needs of EUV lithography.Honors/Awards: Won the best presentation award at the 2024 SRC LMD/NMP conference 2025 SPIE Advanced Lithography + Patterning invited IEUVI workshop speaker
EDUCATION
Guilderland High School
High School Diploma, Engineering
College of Nanoscale Science and Engineering
Bachelor of Science - BS, Nanoscale Engineering
ABOUT JUSTIN NHAN
I am a passionate Ph.D. researcher at the College of Nanotechnology, Science, & Engineering; majoring in Nanoscale Engineering. I love doing R&D research on computer chips in the semiconductor industry, and solving various problems in microelectronic applications around the world!
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