Jun Tan

Mask Frame Design Engineer at Intel Corporation

Role
Mask Frame Design Engineer at Intel
Location
Hillsboro, OR, US
LinkedIn followers
500 followers

About Jun Tan

Semiconductor industry worker involved in multiple positions.

Experience

  1. Mask Frame Design Engineer

    Intel

    Jan 2024 — Present · Hillsboro, OR, US

Education

  • Rutgers University

    Certificate in Science and Technology Management, Master of Business and Science

    2010 — 2013

  • Nanjing University

    BS, Physics

    2001 — 2005

  • Rutgers University

    Ph.D., Electrical and Computer Engineering

    2008 — 2013

  • Shanghai Institute of Technical Physics, CAS

    Master, Microelectronics

    2005 — 2008

Skills

  • Nanotechnology
  • Profilometer
  • Cadence
  • Sputtering
  • Characterization
  • E-Beam Evaporation
  • Wet Chemical Etching
  • L-Edit
  • Rie
  • Thin Films
  • Laser Writer
  • Nanomaterials
  • Nanofabrication
  • Vlsi Design
  • E-Beam Lithography
  • Scanning Electron Microscopy
  • Electron Beam Lithography
  • Research
  • Comsol
  • R-Soft
  • Microfabrication
  • Icp
  • Photolithography
  • Photonics Devices Characterization
  • Lumerical
  • Photonics
  • Pecvd
  • Vlsi
  • Sem
  • Rta
  • Tem
  • C++
  • Afm
  • Matlab
  • Sensors
  • Thermal Oxidation
  • Sputter Deposition
  • Mems

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Jun Tan — Mask Frame Design Engineer at Intel in Hillsboro, OR, US | Unifers