Fikadu Alema

About Fikadu Alema

As a Principal Staff Scientist at Agnitron Technology, I specialize in wide bandgap oxides and nitrides thin films for short-wavelength emitters and photodetectors, utilizing MOCVD and MBE techniques. I possess extensive hands-on experience in depositing and characterizing a variety of thin films, including MgZnO, Ga₂O₃, GaN, and ferroelectric materials. My expertise encompasses multiple deposition methods, such as MOCVD, RF magnetron sputtering, thermal evaporation, and spin coating, as well as the fabrication of sputtering targets. I am proficient in various characterization techniques, both analytical (PXRD, GIXRD, XRF, XRR, AFM, SEM, Raman, FTIR, UV/Vis, XPS, ICP-OES, RBS, SE, PL, CL) and electrical (photodetector spectral response, leakage current, dielectric tunability, and loss). Additionally, I have a solid foundation in statistical physics, organic-inorganic hybrid materials, and nanowires.

Experience

1. R & d Manager

   Agnitron Technology, Inc

   Nov 2023 — Present

   R&D Manager with expertise in project and lab management, skilled in leading diverse teams and training junior staff. I have secured over $3.4M in funding through SBIR/STTR and other agencies for MOCVD projects focused on AlN, Ga₂O₃, and ferroelectric nitrides like AlScN and AlYN. As Principal Investigator, I concentrate on scaling Ga₂O₃ growth on 4” substrates and serve as Co-PI on dopant activation research in AlN. I also develop MOCVD processes for ferroelectric nitrides in non-volatile memory and pyroelectric devices while actively contributing to publications and representing my company at scientific conferences.

Education

• Bahir Dar University

  Bachelor of Education (BEd), Physics

  1999 — 2003

• Addis Ababa University

  Master of Science (MSc), Statistical Physics

  2004 — 2006

• North Dakota State University

  Doctor of Philosophy (PhD), Materials and Nanotechnology

  2009 — 2014

• Universidade de Aveiro

  Master of Science (MSc), Materials Sciences

  2007 — 2009