Ashish Agrawal

Silicon Technologist, Components Research, Intel Corporation

Role
Sr Device Engineer at Intel
Location
Hillsboro, OR, US
LinkedIn followers
500 followers

Experience

  1. Sr Device Engineer

    Intel

    Dec 2014 — Present · Hillsboro, OR, US

    R&D in semiconductor Front-end materials and physics, lead electrical characterizationengineer with strong background in device physics and material science• Design-Technology Co-Optimization (DTCO) analysis of novel materials, device andarchitecture for future scaled technology nodes

Education

  • Penn State University

    Master of Science (M.S.), Electrical Engineering

    2009 — 2011

  • Penn State University

    Doctor of Philosophy (Ph.D.), Electrical Engineering

    2011 — 2014

  • Visvesvaraya National Institute of Technology

    B. Tech, Electrical, Electronics and Communications Engineering

    2005 — 2009

Skills

  • Semiconductors
  • Semiconductor Device
  • Labview
  • Matlab
  • C++
  • Afm
  • Characterization
  • Photolithography
  • Physics
  • Thin Films
  • Simulations
  • Semiconductor Fabrication
  • Device Characterization
  • Compound Semiconductors
  • C
  • Materials Science
  • Microfabrication
  • Scanning Electron Microscopy
  • Silicon
  • Nanotechnology

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Ashish Agrawal — Sr Device Engineer at Intel in Hillsboro, OR, US | Unifers